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Creators/Authors contains: "Scheideler, WJ"

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  1. We present a method of fabricating uniform, large area indium oxysulfide (InOxSy) films using a vacuum-free continuous liquid metal printing method (CLMP) and sulfurization process for high-performance multi-wavelength photodetection. CLMP enables rapid printing of wide area (>10 cm2/s) metal oxide films of single nm-scale thickness at process temperatures just above 150 °C, which can be partially converted to metal oxy-chalcogenide thin films at back-end-of line (BEOL) process temperatures. Phototransistors fabricated from 16 nm-thick InOxSy achieved responsivities as high as 280 A/W and respond to wavelengths as long as 630 nm, enabling both classification of multiple wavelengths and readout of intensity assisted by machine learning models. 
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    Free, publicly-accessible full text available June 25, 2026